These techniques include microcontact printing (or soft lithography), [1] nanoimprint … control of polymer crystallization,[37]and in biological applications (e.g … DOI: 10.1002/adma.200600882 Nanoimprint Lithography: Methods and Material Requirements** By L. Jay Guo * 1. Introduction The ability to fabricate structures from the micro-to the nanoscalewith high precision in a wide variety of materials is of crucial importance to the advancement of micro-andnano- technology and thenanosciences. The …

An overlay accuracy of 50 nmhasbeen achieved by using interferometric in situ alignment techniques .[16]Higher degrees of accuracy can also be anticipated. Although NIL-based approaches have proven excellent resolutions, there are still significant challenges in meeting the stringent requirements of semiconductor IC manufacturing, especially in terms of defect control and production-level throughput, which requires printing 60-80 wafers per hour with extremely high yields. On the other hand, because of its simplicity this technique has found numerous applications in electronics (e.g., hybrid plastic electronics,[17]organicelec- tronicsand photonics, [18,19] nanoelectronic devices in Si [20,21] andinGaAs[22]), in photonics (e.g., organic lasers, [23] conjugated[24]and nonlinear optical polymer nanostructures, [25] high- resolution organic light-emitting diode (OLED) pixels, [26,27] diffractive optical elements ,[28]broadband polarizers [29-31] ), in magnetic devices (e.g., single-domain magnetic struc- tures, [32,33] high-density patterned magnetic media and high- capacity disks, [34,35,36] ), in nanoscale control of polymer crystallization,[37]and in biological applications (e.g., manipulating DNA innanofluidic channels, [38,39] nanoscaleprotein pattern- ing, [40,41] the effect of imprintednanostructures on cell cul- ture[42]). Because nanoimprint lithography is based on the mechani- calmoldingof polymer materials, which is drastically different from other traditional lithographic techniques, it faces anew set of issues and challenges. In the following, a detaileddiscus- REVIEW L. J. Guo /Nanoimprint Lithography 496 www.advmat.de ©2007 WILEY-VCHVerlagGmbH&Co. KGaA, Weinheim Adv. Mater. 2007 , 19 , 495-513 L. Jay Guoisan associate professor of Electrical Engineering and Computer Science at the Uni- versityof Michigan. He has been involved in the development of nanoimprint technology since 1996 andhasexploited numerous applications in electronic and photonic devices. He obtained hisB.S. degree from Nankai University (China) in 1990, and M.S. and Ph.D. degrees from the University of Minnesota (USA) in 1995 and 1997, respectively. His Ph.D. thesis was on semicon- ductorsingle-electron transistors and memories. From 1997 to 1999, he was a research associate fellow at Princeton University (USA). His current research interests include the development and applications of imprinting and printing techniques to the fabrication of functional nanostruc- tures, the study ofplasmonicnanophotonics and photonic microresonators for biosensingappli- cations, research on organic LEDsandphotovotaics,

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